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Title
Verfahren zur Herstellung eines fotoelektronischen Mikrochips, der eine lichtundurchlaessige Schicht aufweist
Date Issued
1998
Author(s)
Guyenot, V.
Risse, S.
Lude, C.
Patent No
1996-19654828
Abstract
The method involves using an ink, an indian ink, a lacquer or a coloured or blackened adhesive as the opaque film (5). This is applied using a modified ink-jet method whereby droplets are sprayed on contactlessly. The covering film can be applied in drop-on-demand mode. The movement of the ink-jet spray head (6) relative to the microchip is controlled using data directly derived from the layout of the microchip. USE - E.g. for chips with photoelectric functions and other regions with structures sensitive to light. ADVANTAGE - Enables opaque film to be applied at low cost and with little labour.
Language
de
Patenprio
DE 1996-19654828 A: 19961223