
Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Verfahren zur Beschichtung von sub-Mikrometerstrukturen und seine Anwendung
Method of coating submicrometer structures for highly integrated circuits - by vapour coating using a transport inert gas..
| DE 1995-19513918 A: 19950412 |
| DE 1995-19513918 A: 19950412 |
| DE 19513918 C1: 19961107 |
| C23C0014 |
|
| Deutsch |
| Patent, Elektronische Publikation |
| Fraunhofer IST () |
Abstract
Submicrometer structures are coated by cathodic sputtering or vaporising a target material in a high or low vacuum chamber with a carrier inert gas going past the target, collecting the vapour material and transporting it perpendicularly onto the surface to be coated. USE - Coating highly integrated circuits. ADVANTAGE - The bottom and sides of small surface depressions are coated at high speed without the depressions becoming fully filled in.