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Verfahren zum Herstellen einer wasserfreien Siliziumdioxidschicht

Process for the production of a moistureless silicon dioxide layer
 
: Klumpp, A.

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Frontpage ()

DE 1990-4018449 A: 19900608
DE 1990-4018449 A: 19900608
DE 4018449 C1: 19911017
H01L0021
Deutsch
Patent, Elektronische Publikation
Fraunhofer IZM ()

Abstract
In a process for the production of a moistureless silicon dioxide layer starting from a silicate layer, polysiloxane is photoinduced, polymerized and separated, whereupon the polysiloxane layer is converted into a silicate layer. By transforming the the silicate layer by chemical reaction of the water bound in said layer by means of silane, the silicate layer is converted into a moistureless silicon dioxide layer.

: http://publica.fraunhofer.de/dokumente/PX-38859.html