Verfahren zum Herstellen einer mikromechanischen Oberflaechenstruktur
Date Issued
2001
Author(s)
Kozlowski, F.
Patent No
1994-4423396
Abstract
In order to produce a micromechanical surface structure, a sacrificial layer is applied to a substrate and a structure layer is applied to the sacrifical layer. Part of the sacrificial layer is removed to expose a movable section of the sacrificia layer. In order to prevent the movable section of the sacrificial layer from adhering to the substrate, at least that area of the sacrifical layer which is located between the movable section and the substrate is formed from a dry-etchable material. Moreover, uneven areas are provided on the surface of the substrate below the movable section of the surface structure.