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Verfahren und Vorrichtung zur Behandlung von Substratoberflaechen

Processing substrate surfaces for activation, coating and material removal - using inert-gas stream to prevent entry of reactive gas into the discharge region.
: Jung, T.

Frontpage ()

DE 1995-19505268 A: 19950216
EP 1996-102259 A: 19960215
EP 727508 B1: 19990609
Patent, Elektronische Publikation
Fraunhofer IST ()

An inert-gas plasma is produced by means of a glow discharge of a hollow cathode (2) in vacuum, and is directed towards the substrate (1). A reactive-gas stream is delivered, by stream or diffusion between the cathode and the substrate. The plasma conditions and/or the delivery of the inert-gas plasma is adjusted so that a reaction between the reactive gas and the cathode material is largely prevented. Entry of reactive gas into the discharge region of the hollow cathode is prevented by means of an inert-gas stream (4) from its supply unit (4). USE - For coating, material removal and activation on substrate surfaces. ADVANTAGE - The scope of surface processing is broadened n a simple manner. Processing of larger surface regions is made possible.