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Verfahren und Vorrichtung zum Vergueten von Oberflaechen

Plasma surface treatment process involves hollow cathode self-cleaning.
 
: Jung, T.

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Frontpage ()

DE 1997-19755902 A: 19971208
DE 1997-19755902 A: 19971208
EP 1998-964488 AW: 19981208
WO 1998-EP7910 A: 19981208
DE 19755902 C1: 19990512
EP 1038306 B1: 20040428
H01J0037
Deutsch
Patent, Elektronische Publikation
Fraunhofer IST ()

Abstract
NOVELTY - In a glow discharge plasma surface treatment process using a hollow cathode, the hollow cathode is maintained at a stable self-cleaning temperature by taking into account glow discharge heating, thermal conduction through a reactive gas and heat radiation to a cooled anode. DETAILED DESCRIPTION - In substrate surface treatment by means of a glow discharge plasma produced using a hollow cathode and a reactive gas, the reactive gas is passed through the hollow cathode and/or the space between the substrate and the hollow cathode and the hollow cathode is maintained at a stable self-cleaning temperature, at which parasitic deposits are removed and/or converted, by taking into account glow discharge heating, thermal conduction through the reactive gas and radiation to a cooled anode. An INDEPENDENT CLAIM is also included for an apparatus for carrying out the above process. USE - Used for surface coating or surface modification of substrates not only in a hard vacuum but also at a tmospheric pressure. ADVANTAGE - The process provides self-cleaning of the hollow cathode by desorption, evaporation, sputtering or detachment of parasitic deposits or by making such deposits electroconductive so that stable operation of the hollow cathode is possible without large volume inert gas flow.

: http://publica.fraunhofer.de/dokumente/PX-38588.html