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Verfahren und Anordnung zur Plasma-Erzeugung
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Title
Verfahren und Anordnung zur Plasma-Erzeugung
Date Issued
1996
Author(s)
Kozlowski, F.
Steiner, P.
Lang, W.
Sauter, M.
Richter, A.
Patent No
1993-4304846
Abstract
Plasma is generated by applying a voltage to points at a distance from each other on a microporous body. This can take place, for example, by applying a voltage between 50 V and 100 V across a microporous laser of a silicon wafer
Language
de
Institute
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM
Link
http://worldwide.espacenet.com/publicationDetails/biblio?DB=worldwide.espacenet.com&locale=en_EP&FT=D&CC=DE&NR=4304846A
Patenprio
DE 1993-4304846 A: 19930217