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Verfahren der Roentgenfluoreszenzmikroskopie

X-ray fluorescence microscopy for low atomic number samples - by exciting pulsed pinched plasma using laser to produce X-rays to analyse sample.
: Neff, W.; Rothweiler, D.; Lebert, R.; Bergmann, K.; Boebel, F.G.; Hanke, R.F.

Frontpage ()

DE 1995-19540195 A: 19951030
DE 1995-19540195 A: 19951030
DE 19540195 C2: 20000120
Patent, Elektronische Publikation
Fraunhofer ILT ()

X-ray fluorescence microscopy process in which a pulsed pinched plasma is excited by laser to produce X-rays (11) to analyse a sample (12) having at least one chemical element. X- ray fluorescent radiation is emitted from the sample and by means of a Fresnel zone plate (15) or another similar X-ray optical imaging system, which has been adjusted to the wavelength of the element to be examined, forms an image on an X-ray sensitive detector (14). The exciting radiation (11) has a wavelength which is just below a maximum (resonance) absorption wavelength. USE - The process is used in analysis of samples of low atomic number, typically less than 10. It is especially used in semi-conductor development and process control, as it is necessary to measure light element quantities and positions very accurately and in a non- destructive manner. Can also be used to determine the thickness of an element layer within a sample. ADVANTAGE - Previous X-ray fluorescence processes have been particularly suited to heavier elements or have required difficult and expensive modification for analysis of light elements.