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Title
Verfahren der Roentgenfluoreszenzmikroskopie
Date Issued
2000
Author(s)
Patent No
1995-19540195
Abstract
X-ray fluorescence microscopy process in which a pulsed pinched plasma is excited by laser to produce X-rays (11) to analyse a sample (12) having at least one chemical element. X- ray fluorescent radiation is emitted from the sample and by means of a Fresnel zone plate (15) or another similar X-ray optical imaging system, which has been adjusted to the wavelength of the element to be examined, forms an image on an X-ray sensitive detector (14). The exciting radiation (11) has a wavelength which is just below a maximum (resonance) absorption wavelength. USE - The process is used in analysis of samples of low atomic number, typically less than 10. It is especially used in semi-conductor development and process control, as it is necessary to measure light element quantities and positions very accurately and in a non- destructive manner. Can also be used to determine the thickness of an element layer within a sample. ADVANTAGE - Previous X-ray fluorescence processes have been particularly suited to heavier elements or have required difficult and expensive modification for analysis of light elements.
Language
de
Institute
Patenprio
DE 1995-19540195 A: 19951030