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Using porous silicon as a sacrificial layer

 
: Steiner, P.; Richter, A.; Lang, W.

:

Journal of micromechanics and microengineering 3 (1993), Nr.2
ISSN: 0960-1317
ISSN: 1361-6439
Englisch
Zeitschriftenaufsatz
Fraunhofer IFT; 2000 dem IZM eingegliedert
porous silicon; sacrificial layer; surface micromachining

Abstract
With porous silicon a thick sacrificial layer for applications in bulk and surface micromachining can be achieved. The technology of free standing parts of polysilicon is described. The etching process and the use of different masking layers are investigated.

: http://publica.fraunhofer.de/dokumente/PX-38083.html