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Untersuchungen über Regelparameter in einer Lithographiezelle

Investigations of control parameters for a lithographic cluster
: Pfitzner, L.; Ryssel, H.; Temmel, G.; Zielonka, G.

Electrochemical Society -ECS-:
The Electrochemical Society, Spring Meeting '90. Extended Abstracts
Electrochemical Society (Spring Meeting) <1990, Montreal>
Fraunhofer IIS B ( IISB) ()
control loop; control parameter; endpoint detection; Endpunktdetektion; Fertigung; Halbleiter; in situ; Lithographie; lithography cluster; manufacturing; on-line; process automation; Prozeßautomatisierung; Regelkreis; Regelparameter; semiconductor; Zelle

Lithography clusters with on-line processing will be used for critical exposure steps. Spin coating optimization for ultraplanarized single/multi -layer resists are, therefore, a prerequisit for process reliability. Therefore, we compare in situ measured resist thickness during spin coating and baking with a mathematical modell in order to investigate parameters for fast closed loop cluster control. Results are used to discuss further automation concepts of on-line and in situ processing in lithography clusters.