Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Untersuchungen über Regelparameter in einer Lithographiezelle

Investigations of control parameters for a lithographic cluster
 
: Pfitzner, L.; Ryssel, H.; Temmel, G.; Zielonka, G.

Electrochemical Society -ECS-:
The Electrochemical Society, Spring Meeting '90. Extended Abstracts
1990
S.608
Electrochemical Society (Spring Meeting) <1990, Montreal>
Englisch
Konferenzbeitrag
Fraunhofer IIS B ( IISB) ()
control loop; control parameter; endpoint detection; Endpunktdetektion; Fertigung; Halbleiter; in situ; Lithographie; lithography cluster; manufacturing; on-line; process automation; Prozeßautomatisierung; Regelkreis; Regelparameter; semiconductor; Zelle

Abstract
Lithography clusters with on-line processing will be used for critical exposure steps. Spin coating optimization for ultraplanarized single/multi -layer resists are, therefore, a prerequisit for process reliability. Therefore, we compare in situ measured resist thickness during spin coating and baking with a mathematical modell in order to investigate parameters for fast closed loop cluster control. Results are used to discuss further automation concepts of on-line and in situ processing in lithography clusters.

: http://publica.fraunhofer.de/dokumente/PX-37863.html