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Thermal annealing effects on the mechanical properties of plasma-enhanced chemical vapor deposited silicon oxide films
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1992
Journal Article
Titel
Thermal annealing effects on the mechanical properties of plasma-enhanced chemical vapor deposited silicon oxide films
Author(s)
Schliwinski, H.-J.
Schnakenberg, U.
Windbracke, W.
Neff, H.
Lange, P.
Zeitschrift
Journal of the Electrochemical Society
DOI
10.1149/1.2069484
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT