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A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the SOLID lithography simulator
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1991
Journal Article
Titel
A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the SOLID lithography simulator
Author(s)
Mewes, D.
Schießl-Hoyler, R.
Czech, G.
Henke, W.
Weiß, M.
Zeitschrift
Microelectronic engineering
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT