Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

The STORM technology CAD system



Microelectronics journal 26 (1995), Nr.2-3, S.113-135
ISSN: 0026-2692
ISSN: 0959-8324
Fraunhofer IIS B ( IISB) ()
CAD/CAM; digital simulation; semiconductor process modelling

This paper gives an outline of the STORM TCAD system. STORM is a program system for the two-dimensional simulation of semiconductor fabrication process sequences and the optimization of the electrical behaviour of the devices fabricated. It has been developed within an ESPRIT project by a consortium of European companies and research institutes. In this presentation, the software structure of STORM is described, followed by a discussion of the physical models developed. Finally, some application examples are given.