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Simulation of complete process step sequences in silicon technology

 
: Pichler, P.; Lorenz, J.

Tucci, S. ; Society for Computer Simulation International -SCS-:
Simulation applied to manufacturing energy and environmental studies and electronics and computer engineering. Proceedings of the 1989 European Simulation Multiconference
Ghent, 1989
ISBN: 0-911801-55-3
S.285-290
European Simulation Multiconference (ESM) <1989, Rome>
Englisch
Konferenzbeitrag
Fraunhofer IIS B ( IISB) ()
diffusion; ion implantation; Ionenimplantation; oxidation; process simulation; Prozeßsimulation; simulation program; Simulationsprogramm

Abstract
Since the publication of the first one-dimensional process simulation programs, increasing activities have been carried out in the development and improvement of the physical models involved and the development of more general programs which may be used for simulations in two or three dimensions. In this paper, some aspects of recent work carried out at FhG-AIS are discussed.

: http://publica.fraunhofer.de/dokumente/PX-33685.html