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Adhesion problems in deep-etch X-ray lithography caused by fluorescence radiation from the plating-base
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1994
Journal Article
Titel
Adhesion problems in deep-etch X-ray lithography caused by fluorescence radiation from the plating-base
Author(s)
Pantenburg, F.J.
El-Kholi, A.
Mohr, J.
Schulz, J.
Oertel, H.K.
Chlebek, J.
Huber, H.-L.
Zeitschrift
Microelectronic engineering
DOI
10.1016/0167-9317(94)90142-2
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT