Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Reflexion supported pyrometric interferometry. A new tool for in situ, real time temperature control in semiconductor manufacturing

: Böbel, F.G.; Möller, H.; Preiß, W.

Institute of Electrical and Electronics Engineers -IEEE-; Semiconductor Equipment and Materials International -SEMI-, San Jose/Calif.:
IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop 1993. Theme: Factory of the future. Proceedings
New York/N.Y.: IEEE, 1993
ISBN: 0-7803-1367-4
Advanced Semiconductor Manufaturing Conference and Workshop (ASMC) <4, 1993, Boston/Mass.>
Fraunhofer IIS A ( IIS) ()
Halbleiterfertigung; in situ process control; in situ Prozeßkontrolle; measurement of film thickness; pyrometric interferometry; pyrometrische Interferometrie; Schichtdickenmessung; semiconductor fabrication; temperature measurement; Temperaturmessung