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Recent contributions to the development of non-optical lithography

: Heuberger, A.; Brünger, W.


Microelectronic engineering 34 (1996), Nr.1, S.39-50
ISSN: 0167-9317
Fraunhofer ISIT ()

Lithography of quarter micron devices is definitely in the domain of optical lithography, however, for the 0.18 mu m 1 Gbit devices the lithography tools have not been decided yet. There is the possibility of i-line and DUV steppers, e-beam direct write, X-ray lithography and ion projection lithography. This paper will describe recent activities of the Fraunhofer ISiT in the field of e-beam direct write, X-ray and ion projection lithography.