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PZT-Dickschicht und Verfahren zu deren Herstellung

PZT thick film and process for its production
 
: Schoenecker, A.; Seffner, L.; Gesemann, H.J.

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Frontpage ()

DE 1995-19503517 A: 19950203
DE 1995-19503517 A: 19950203
DE 19503517 C1: 19960627
H01L0041
Deutsch
Patent, Elektronische Publikation
Fraunhofer IKTS ()

Abstract
The invention relates to the fields of electrical engineering and electronics, and refers to PZT thick films with resistance gradients which, for example, can be applied to resonators, and a process for their production. The invention is based on the technical problem of specifying and producing PZT thick films with high P<-r values of > 20 C/cm->2, which adhere strongly to the substrate despite contraction. The problem is solved by the existence of a high concentration of an active substance in the PZT thick film in the area of the metallized substrate surface and this concentration decreases with increasing distance from the area of the metallized substrate surface, whereby the active substance causes a reduction in the resistance of the PZT thick film. The problem on which the invention is based is also solved by a process for the production of a PZT thick film in which a high concentration of an active substance is generated in the area of the metallized substrate surface and t he concentration of this active substance is reduced with increasing distance from the area of the metallized substrate surface.

: http://publica.fraunhofer.de/dokumente/PX-30291.html