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Prepolymer film growth by adsorption out of solution on silicon and aluminium. An atomic force microscope study

Wachstum von Prepolymer Filmen durch Adsorption aus der Lösung auf Silizium und Aluminium. Eine Rasterkraftmirkroskopuntersuchung

Fresenius' Zeitschrift für Analytische Chemie 353 (1995), S.419-426
ISSN: 0016-1152
ISSN: 0372-7920
Fraunhofer IFAM ()
Fraunhofer IZM, Einrichtung Polymermaterialien und Composite ( Fraunhofer EPC) ()
adsorption; aluminium; atomic force microscopy; film growth; Filmwachstum; prepolymer; Rasterkraftmikroskopie; silicon; Silizium

A cyanurate prepolymer was applied to smooth silicon wafers or to distinctly structured aluminum coatings. The surface composition of the substrates was investigated by X-ray Photoelectron Spectroscopy (XPS), Auger Electron Spectroscopy (AES) and Ellipsometry. The application methods, spin coating and dip coating represent adsorption by a technical process exerting significant shear stresses or nearly equilibrated conditions, respectively. The mean thickness of the prepolymer film was adjusted by variation of the concentration of the solution and checked by ellipsometry. Atomic Force Microscopy (AFM) monitored the development of the respective film morphologies of all 4 systems (silicon / aluminum, spin / dip coating) in the mean film thickness range from 1 to 50 nm.