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Plasma focus as a radiation source for X-ray lithography
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1985
Journal Article
Titel
Plasma focus as a radiation source for X-ray lithography
Author(s)
Eberle, J.
Krompholz, H.
Lebert, R.
Neff, W.
Noll, R.
Zeitschrift
Microelectronic engineering
Language
English
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Fraunhofer-Institut für Lasertechnik ILT