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1996
Conference Paper
Titel
Plasma-enhanced chemical vapour deposition of thin films by corona discharge at atmospheric pressure
Abstract
Corona discharges (also called dielectric barrier discharges or silent discharges consisting of small localised microdischarges at or near atmospheric pressure are used for the reactive deposition of organic and inorganic thin films. Inorganic SiOx thin films were deposited with tetramethylsilane (TMS, Si[CH3]4) or tretraethylortosilicate (TEOS, Si[OC2H5]4) in oxygen containing atmospheres. In inert argon/nitrogen atmospheres TMS formed plasmapolymer-like hydrogenated silicon carbon coatings (SiC:H). Hydrocarbons like methane (CH4), ethine (C2H2) or propargylalcohol (HC2CH2OH) as monomers lead to polymer-like amorphous hydrogenated carbon coatings (a-C:H). With tetrafluoroethene (C2F4) teflon like carbon coatings (a-C:F) were deposited. Surface energies between 16 and 66 mN/m on silicon and between 16 and 62 mN/m on polypropylene were obtained depending on the film composition.
Language
English