Options
1989
Journal Article
Titel
Plasma deposition, properties and structure of amorphous hydrogenated carbon films.
Alternative
Plasmaabscheidung, Eigenschaften und Struktur amorpher, wasserstoffhaltiger Kohlenstoffschichten
Abstract
Plasma deposition and properties of a-C:H are reviewed. The role of process gas, plasma chemistry and plasma surface interaction is discussed. It is shown that the deposition energy of the hydrocarbons is the most critical deposition parameter in determining the film properties. Hard a-C:H films with precursor-independent properties are obtained if the deposition energy is large enough to allow efficient fragmentation of the energetic hydrocarbons at the film surface. Otherwise, soft polymerlike films are obtained at low deposition energies. As a key for the understanding of the a-C:H properties, hydrogen incorporation, carbon bonding and network structure - as studied by IR and Raman spectroscopy - are discussed.
Author(s)