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Open silicon stencil masks for demagnifying ion projection

 
: Heuberger, A.; Buchmann, L.-M.; Csepregi, L.; Müller, K.P.

Microelectronic engineering 6 (1987), Nr.1-4, S.333-342
ISSN: 0167-9317
International Conference on Microlithography: Microcircuit Engineering (ME) <13, 1987, Paris>
Englisch
Konferenzbeitrag
Fraunhofer ISIT ()
CMOS-technology; CMOS-Techologie; ion beam etching; ion beam lithography; Ionenätzung; Ionenlithographie; mask technology; Maskentechnologie

Abstract
The demagnifying ion projection, a lithography technique for patterns in the sub-mym-range, requires open stencil masks. A process scheme for these masks is proposed which involves CMOS technology and a synchrotron exposure step. The masks obtained were well adapted to the special requirements of the apparatus concerning beam divergence and heat load. (IMT)

: http://publica.fraunhofer.de/dokumente/PX-27266.html