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Novel potentiometric silicon sensor for medical devices


Foundation for Sensor and Actuator Technology, Stockholm:
8th International Conference on Solid-State Sensors and Actuators 1995 and Eurosensors IX. Digest of technical papers. Vol. 2. Sessions A7-D13. Papers No.232-496
Stockholm: Congrex, 1995
ISBN: 91-630-3473-5
International Conference on Solid-State Sensors and Actuators <8, 1995, Stockholm>
Eurosensors <9, 1995, Stockholm>
Fraunhofer ISIT ()
biomedical equipment; biosensors; chemical sensors; micromachining; microsensors; potentiometers; silicon

The fabrication process for a potentiometric silicon sensor will be described. The sensor was fabricated in bulk silicon micromachining using a double side wafer process. A small channel was etched anisotropically in (100) silicon. The back side groove was metallised. To form an ion-selective electrode an ion-selective membrane was deposited in the channel. Additionally, a novel type of Ag/AgCl/Ag reference electrode was integrated on the front side of the chip. The small size of the sensor allows the application in catheter systems.