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New system for fast submicron laser direct writing

: Kück, Heinz; Bollerott, Michael; Doleschal, Wolfgang; Gehner, Andreas; Kunze, Detlef; Grundke, Wolfram; Melcher, Rolf; Paufler, Jörg; Seltmann, Rolf; Zimmer, Günter


Brunner, T.A. ; Semiconductor Equipment and Materials International -SEMI-, San Jose/Calif.; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical/laser microlithography VIII : 22-24 February 1995, Santa Clara, California
Bellingham, Wash.: SPIE, 1995 (SPIE Proceedings Series 2440)
ISBN: 0-8194-1788-2
Conference "Optical/Laser Microlithography" <1995, Santa Clara/Calif.>
Fraunhofer IMS, Außenstelle Dresden ( IPMS) ()
Fraunhofer IMS ()
DUV; Elastomer; Excimer-Laser; Modulation von Licht; Photolithographie; laser direct writing; optical lithography; spatial light modulator; deformable viscoelastic layer; exposure on the fly; excimer laser; DUV lithography

We report on a new system for submicron lithography by fast laser direct writing, where a programmable phase modulating spatial light modulator (SLM) is imaged onto the wafer using flash on the fly exposure with an excimer laser light source. A SLM with 512x464 pixels has been developed and fabricated using a CMOS active matrix and a reflective, deformable viscoelastic layer on top. Using this modulator for image generation a demonstrator exposure tool for 0.6µm minimum feature size has been designed and set up including all the components necessary for the exposure of a complete lithography layer from VAD layout data. The demonstrator is shown to give good quality photoresist pattern on the wafer at a throughput of roughly one 4"-wafer per hour. Based on our experimental results we propose a tool with a throughput of nine 6"-wafers per hour and conclude that the new principle of operation has the potential of high performance optical direct writing lithography.