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New system for fast maskless submicron lithography - challenge on fast flexible data handling

: Kück, H.

Sematech, Austin/Tex.:
2nd Litho/Design '95. Workshop
Vail (Colorado) >, 1995
Litho/Design <2, 1995, Vail/Colo.>
Fraunhofer IMS, Außenstelle Dresden ( IPMS) ()
DUV; Elastomer; Modulation von Licht; Photolithographie

We report on a new system for submicron lithography by fast laser direct writing, where a programmable phase modulating spatial light modulator (SLM) is imaged onto the wafer using flash on the fly exposure with an excimer laser light source. This new principle for maskless optical lithography has been investigated for the first time. A SLM with 512x464 pixels has been developed and fabricated using a CMOS active matrix and a reflective, deformable viscoelastic layer on top. Using this modulator for image generation a demonstrator exposure tool for 0.6µm minimum feature size has been designed and set up including all the components necessary for the exposure of a complete lithography layer from VAD layout data. The demonstrator is shown to give good quality photoresist pattern on the wafer.