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Narrowband laser produced extreme ultraviolet sources adapted to silicon/molybdenum multilayer optics

: Schriever, G.; Bergmann, K.; Lebert, R.


Journal of applied physics 83 (1998), Nr.9, S.4566-4571 : Ill., Lit.
ISSN: 0021-8979
ISSN: 1089-7550
Fraunhofer ILT ()
coarse filtering; electron density; emission line; multilayer application; target element; ultraviolet radiation; wavelength region

The extreme ultraviolet radiation emitted from a plasma generated by a pulsed Nd:yttrium aluminum garnet laser is investigated around 13 nm wavelength for several low Z elements (lithium, nitrogen, oxygen, fluorine). A narrowband EUV source can be designed by using the narrowband line emission of low Z elements in combination with the broadband reflection characteristic of silicon/molybdenum (Si/Mo) multilayer mirrors.Experimental results are discussed within a theoretical modell which allows a deduction of an optimization criterion for a maximum conversion efficiency.The Lyman-alpha line of hydrogenlike lithium ions fulfills the demands for high intense, free-standing narrowband emission, at the long wavelength side of the silicon absorption L edge.