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Micromirror spatial light modulators
|Ehrfeld, W. ; Institut für Mikrotechnik Mainz GmbH -IMM-:|
3rd International Conference on Micro Opto Electro Mechanical Systems (Optical MEMS) 1999. Proceedings
|International Conference on Micro Opto Electro Mechanical Systems (MOEMS) <3, 1999, Mainz>|
|Fraunhofer IMS, Außenstelle Dresden ( IPMS) ()|
| CMOS; Direktbelichter; Lichtmodulator; Maskenlose Lithographie; MEMS; Mikrosystem; MOEMS|
The devices consist of an array of independently addressable CMOS DRAM cells each controlling a micromachined mirror pixel. The micromirrors are fabricated in a sacrificial layer technique forming freestanding mirror elements over an air gap with an underlying address electrode. Only 3 additional masks are needed after the CMOS process. Mirrors and support posts are both made of aluminum ensuring a high reflectivity in a wide spectral range from IR to DUV. The pixels themselves can easily be optimized for a great variety of applications, e. g. submicron DUV lithography, maskless direct writing of PCBs, combinatorical chemistry, or wavefront correction. Among the various possible pixel architectures two structures were investigated in more detail. The first type of mirror element is well suited for phase pattern generation in optical imaging applications while the second type is designed for phasefront corrections in adaptive optics. Such micromirrors have been implementedsuccessfully in arrays on passive test devices to investigate the electromechanical properties. The deformation and frequency response have been measured. An evaluation kit was developed including all components for addressing an SLM by user defined image patterns.