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Mass spectrometric study of gas evolution from plasma-deposited fluorohydrogenated amorphous carbon films on heating.

Massenspektroskopische Untersuchung des Effusionsprodukts der aus Plasma abgeschiedenen Fluor- und Kohlenstoffilme nach Aufheizen
 
: Sah, R.E.

Thin solid films (1988), Nr.167, S.255-260 : Abb.,Lit.
ISSN: 0040-6090
Englisch
Zeitschriftenaufsatz
Fraunhofer IAF ()
Kohlenstoffilm; Massenspektroskopie

Abstract
Using thermal desorption spectroscopy the decomposition of hydrogenated, fluorinated and fluorohydrogenated amorphous carbon films (a-C:H, a-C:F and a-C:H,F respecitively) at elevated temperatures up to 700 degree C has been studied. The films were prepared by r.f. (2.3 MHz) plasma deposition from benzene and fluorinated benzenes, C6H6-mFm with 0 equal or smaller than m equal or smaller than 6. While the thermal effusion products of a-C:H are hydrocarbons and hydrogen, those of the a-C:H,F films depend on the degree of fluorination. Partially fluorinated a-C:H,F films corresponding to m = 1 release HF as well as hydrocarbons and hydrogen. The main effusion product of a-C:H,F films with intermediate fluorination (2 equal or smaller than m equal or smaller than 4) is HF. These a-C:H,F films are thermally less stable than a-C:H. More highly fluorinated films, corresponding to m = 5 and 6, release mainly CF4 at temperatures typically 100 degree C higher than the desorption maximum of a-C:H and thus they are thermally more stable than a-C:H. The most important deposition parameter, the bias voltage, has been found to have only little influence on the thermal effusion behaviour of the fluorinated films.

: http://publica.fraunhofer.de/dokumente/PX-22879.html