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Lithography with high depth of focus by an ion projection system2
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1992
Journal Article
Titel
Lithography with high depth of focus by an ion projection system2
Author(s)
Buchmann, L.-M.
Schnakenberg, U.
Torkler, M.
Löschner, H.
Stengl, G.
Traher, C.
Fallmann, W.
Stangl, G.
Cekan, E.
Zeitschrift
Journal of Microelectromechanical Systems
DOI
10.1109/84.186390
Language
English
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Fraunhofer-Institut fĂĽr Siliziumtechnologie ISIT