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Lateral growth rates in laser CVD of microstructures.

Laterale Wachstumsraten beim Laser-CVD von Mikrostrukturen
: Petzoldt, F.; Piglmayer, K.; Kraeuter, W.; Baeuerle, D.

Applied physics. A 35 (1984), Nr.3, S.155-159
ISSN: 0340-3793
ISSN: 0721-7250
ISSN: 0947-8396 (Print)
ISSN: 1432-0630 (Online)
Fraunhofer IFAM ()
chemical vapour deposition; crystal growth; laser radiation; nickel; nickel compound; physical radiation effect

Lateral growth rates of Ni spots deposited on absorbing substrates by decomposition of Ni(CO)4 with visible Kr plus laser light have been measured. The experimental data are consistent with the calculated temperature distributions. The mechanism of decomposition is thermal with an apparent chemical activation energy of 22 plus minus 3 kcal/mole for the temperature range 350 K equal or smaller than T equal or smaller 500 K.