Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy



Applied optics 37 (1998), Nr.7, S.1243-1248 : Ill., Lit.
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Fraunhofer ILT ()
EUV-based process; gas discharge; high photon flux; photoabsorption cross section; photoelectron emission microscope; radiation; x-ray source; XPS analysis

Extended ultraviolet (EUV) emission characteristics of a laser-produced lithium plasma are determined with regard to the requirements of x-ray photoelectron spectroscopy. The main features of interest are spectral distribution, photon flux, bandwidth, source size, and emission duration. Laser-produced lithium plasmas are characterized as emitters of intense narrow-band EUV radiation. It can be estimated that the lithium Lyman-alpha line emission in combination with an ellipsoidal silicon/molybdenum multilayer mirror is a suitable EUV source for an x-ray photoelectron spectroscopy microscope with a 50-meV energy resolution and a 10-mu m lateral resolution.