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Laser and pinch plasma X-ray sources for microscopy and lithography

: Neff, W.; Rothweiler, D.; Eidmann, K.; Lebert, R.; Richter, F.; Winhart, G.

Richardson, M.C. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Applications of Laser Plasma Radiation : 14-16 July 1993, San Diego, California
Bellingham/Wash.: SPIE, 1994 (SPIE Proceedings Series 2015)
ISBN: 0-8194-1264-3
S.32-44 : Abb.,Tab.,Lit.
Conference "Applications of Laser Plasma Radiation" <1993, San Diego/Calif.>
Fraunhofer ILT ()
lithography; monochromaticity; radiation source; radiemetry; recombination; synchrotron

Experimental results on radiative properties of laser produced and pinch plasmas are discussed in comparison and with respect to the specific sets of requirements defined by proximity printing x-ray lithography and full field imaging x-ray microscopy.