Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

International process control and automation for semiconductor manufacturing equipment

: Pfitzner, L.; Ryssel, H.; Schneider, C.

Electrochemical Society -ECS-:
Extended Abstracts of the Fall Meeting 1989 of the Electrochemical Society. Vol. 89-2
Hollywood/Fla., 1989
International Symposium on Automated IC Manufacturing <5, 1989, Hollywood/Fla.>
Fraunhofer IIS B ( IISB) ()
automated semiconductor manufacturing; Automatisierung; Halbleiterfertigung; in situ measurement; in situ-Messung; internal process control; interne Prozeßkontrolle; thermal oxidation; thermische Oxidation

Tighter tolerances in semiconductor manufacturing require reproducible processes. One of the most important steps towards improved processes is the integration of control and measurement systems into production equipment. Prerequisites for automation and internal process control are both the development of in situ and on-line measurement techniques and improved understanding and modelling of manufacturing processes. These aspects are discussed for two key processes in semiconductor manufacturing, thermal oxidation and resist spinning, where tailored solutions for real-time process control are under investigation.