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Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma



Applied optics 38 (1999), Nr.25, S.5413-5417 : Ill., Lit.
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Fraunhofer ILT ()

An extreme-ultraviolet (EUV) radiation source near the 13-nm wavelength generated in a small (1.1 J) pinch plasma is presented. The ignition of the plasma occurs in a pseudosparklike electrode geometry, which allows for omitting a switch between the storage capacity and the electrode system and for low inductive coupling of the electrically stored energy to the plasma. Thus energies of only a few joules aresufficient to create current pulses in the range of several kiloamperes, which lead to a compression and a heating of the plasmas to electron densities of more than 10 (exp 17) cm(-3) and temperatures of several tens of electron volts, which is necessary for emission in the EUV range. As an example, the emission spectrum of an oxygen plasma in the 11-18-nm range is presented. Transitions of beryllium- and lithium-like oxygen ions can be identified. Current waveform and time-resolved measurements of the EUV emission are discussed.