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Highly porous and electrically insulating films deposited by reactive physical vapor deposition

: Lang, W.


Journal of vacuum science and technology A. Vacuum, surfaces and films 8 (1990), Nr.6
ISSN: 0734-2101
Fraunhofer IFT; 2000 dem IZM eingegliedert
porous film; PVD

Highly porous metallic films can be deposited by a modified physical vapor deposition process. The deposition of those films is investigated for several metals. For application in infrared optics and sensors it is often necessary to deposit a highly porous and electrically insulating film. This type of film can be produced by reactive physical vapor deposition of aluminum in a low-pressure O sub O2/Ar atmosphere.