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High-rate PLD of ceramic films with kw-laser

Hochrate PLD keramischer Schichten mit dem kw-CO2-Laser
: Witke, T.; Berthold, J.; Schultrich, B.; Lenk, A.

Mordike, B.L.:
ECLAT, European Conference on Laser Treatment of Materials 1998 including contributions to EUREKA research projects on laser beam and optics characterization/CHOCLAB. Papers
Frankfurt: Werkstoff-Informationsgesellschaft, 1998
ISBN: 3-88355-263-1
European Conference on Laser Treatment of Materials (ECLAT) <1998, Hannover>
Fraunhofer IWS ()
PLD; Laserverfahren; Laserchemie; Keramik; Kohlenstoff

Pulsed Laser Deposition (PLD) is a special PVD process usually based on the ablation of a solid target by very short laser pulses in the nanosecond range. In comparison to other thin film methods it is distinguished by very promising specific advantages. Hence, it is a very attractive tool for fundamental studies of ablation and deposition processes. Nevertheless the industrial use of PLD is limited to few special applications, where the demands can not be fullfilled by other methods in comparable quality.This is caused by serious technological drawbacks, which are inherently connected with the short pulse laser technique: - low productivity (characterized e.g. by deposition volume per time) - low efficiency (expressed e.g. by energy expense per deposition volume) - high investment costs (measured e.g. by costs per volume rate).To overcome these limitations and to spread the potential field of applications for PLD the following guidelines should be followed:- use of pulse lasers with h igh mean power (to increase the productivity),- use of industrial high power lasers widely applied for machining, which represent a rather mature level (to increase efficiency and to decrease the costs),- use of more effective ablation and deposition processes compared with the usual vaporization (to increase productivity and efficiency),- concentration on such filmsystems, which are difficult to prepare by other methods (to use the specific PLD advantages).