Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Functional porous ceramic films by pulsed laser deposition

: Kreutz, E.W.; Gottmann, J.; Sommer, M.; Vosseler, B.; Curdt, A.

Canam, L.T.; Parkhutik, V.:
International Conference "Porous Semiconductors. Science and Technology" 1998. Proceedings
Rayton, 1998
S.222-224 : Ill. Lit.
International Conferece "Porous Semiconductors. Science and Technology" <1998, Rayton>
Fraunhofer ILT ()
deposition technique; emission spectroscopy; energy coupling; ferroelectricity; gas-dynamical equation; laser radiation; optical application; plasma state

Physical vapor deposition techniques are used in a variety of applications to deposit thin films with particular structural and functional properties for applications such as electronic, mechanical, optical and tribological coatings. The vapor/plasma states used in surface and thin film technology are generated by electrical, optical or chemical means. In the case of optical plasma formation, laser radiation is usually used to generate a hot, dense and highly excited plasma.