English
Deutsch
Log In
Password Login
or
Log in with Fraunhofer Smartcard
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Evaluation of an advanced submicron X-ray stepper -XRS200- pattern transfer and alignment accuracy
Details
Full
Export
Statistics
Options
1991
Journal Article
Titel
Evaluation of an advanced submicron X-ray stepper -XRS200- pattern transfer and alignment accuracy
Author(s)
Simon, K.
Gabeli, F.
Zeitschrift
Microelectronic engineering
Konferenz
International Conference on Microlithography: Microcircuit Engineering (ME) 1990
DOI
10.1016/0167-9317(91)90100-R
Language
English
google-scholar
View Details
Fraunhofer-Institut für Siliziumtechnologie ISIT