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Enhanced CAIBE for high-speed OEICs

Verbesserter CAIBE-Prozess für Hochgeschwindigkeits-OEICs


III-Vs Review 7 (1994), Nr.5, S.51-55 : Abb.
ISSN: 0959-3527
ISSN: 0961-1290
Fraunhofer IAF ()
high-speed data transmission; Hochgeschwindigkeitsdatenübertragung; monolithic integration; monolithische Integration; OEIC; QW-laser

Researchers at the Fraunhofer Institute for Applied Solid-State Physics (IAF, Freiburg, Germany), working with Technics Plasma GmbH (Kirchheim, Germany), have developed a UHV CAIBE system specially designed for the fabrication of GaAs-based OEICs. The Fraunhofer team has also developed an enhanced CAIBE etching process which relaxes a number of constraints previously reported in the dry-etching of Al (ind x) Ga (ind 1-x) As-containing optoelectronic device structures.