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Embossed grating lead chalcogenide distributed-feedback lasers.

Bleichalkogenidlaser mit verteilter Rückkoppelung, hergestellt durch eingeprägtes Rückkopplungsgitter
 
: Schlereth, K.-H.; Böttner, H.

:

Journal of vacuum science and technology B. Microelectronics and nanometer structures 10 (1992), Nr.1, S.114-117 : Abb.,Lit.
ISSN: 0734-211X
ISSN: 1071-1023
Englisch
Zeitschriftenaufsatz
Fraunhofer IPM ()
corrugate structure; Halbleiterlaser; IV-VI compound; IV-VI-Verbindung; Laser mit verteilter Rückkopplung; semiconductor laser

Abstract
The successful preparation of double-heterostructure (DH) distributed-feedback (DFB) PbEuSe lasers using an embossing technique for the DFB sub-micrometer grating is reported here for the first time. The submicrometer grating was performed in (111) oriented silicon wafers by holographic exposure and argon ion milling. Using a hydrostatic press this grating was embossed into a lead chalcogenide wafer, covered by a DH structure grown by molecular beam epitaxy. Lasers made from wafers with grating periodicities of 0.678 and 0.755 Mym show DFB characteristics at the corresponding emission wavenumbers around 1420 and 1590 cmhighminus1.

: http://publica.fraunhofer.de/dokumente/PX-11911.html