Einrichtung zur Erzeugung dichter Plasmen in Vakuumprozessen
Date Issued
1999
Author(s)
Morgner, H.
Neumann, M.
Straach, S.
Patent No
1995-19546827
Abstract
The plasma process is used for coating a substrate (4) with AlxOy and a vapour is generated from an aluminium source (3) in a vacuum chamber (2). The plasma is produced by an electron beam (12) directed into the vapour stream. The system consists of an anode (7), cathode (6) and an electromagnet (10). The electron beam is directed through the magnetic field and into the vapour. USE/ADVANTAGE - Surface coating of substrates, such as packaging foil materials. Improved performance.