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E-beam written optically transparent x-ray masks - four levels for an industrial VLSI chip with megabit design rules
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1992
Journal Article
Titel
E-beam written optically transparent x-ray masks - four levels for an industrial VLSI chip with megabit design rules
Author(s)
Jacobs, E.P.
Köhler, C.
Kohlmann, K.T.
Petschner, M.
Reimer, K.
Breithaupt, B.
Demmeler, R.
Ehrlich, C.
Zeitschrift
Microelectronic engineering
Konferenz
International Conference on Microlithography: Microcircuit Engineering (ME) 1991
DOI
10.1016/0167-9317(92)90102-W
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT