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An e-beam comb-probe printer for nanolithography

: Heuberger, A.; Lischke, B.; Christaller, G.; Herrmann, K.H.; Knapek, E.; Kniekamp, H.; Rose, H.; Rüttenauer, W.; Siegel, G.

Microelectronic engineering 9 (1989), S.199-202 : Abb.
ISSN: 0167-9317
Fraunhofer ISIT ()

We propose a printer-type e-beam system to replace writing pattern generators for obtaining throughout improvements in nanolithography. The e-beam comb-probe printer with 1024 probes should be capable of combining 25nm resolution with a total beam current of 5 myA corresponding to an exposure speed of 0,1 cbm/s, which is several orders of magnitude superior to today's latest equipment.