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Verfahren zum Bearbeiten eines Substrats

Method for processing substrate from substrate material, involves treating defects in substrate material and transmission measurement of substrate is carried out to obtain transmission value
 
: Berwian, P.; Friedrich, J.

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Frontpage ()

DE 2007-102007029666 A: 20070627
DE 102007029666 A: 20070627
H01L0021
G01N0021
Deutsch
Patent, Elektronische Publikation
Fraunhofer IISB ()

Abstract
(A1) Es wird ein Verfahren (700) zum Bearbeiten eines Substrats aus einem Substratmaterial beschrieben, wobei das Bearbeiten zu Defekten in dem Substratmaterial fuehrt, mit: Durchfuehren (710) einer Transmissionsmessung an dem Substrat, um einen Transmissionswert zu erhalten, der ein Mass fuer die Defekte in dem Substratmaterial ist; und Steuern (720) des Bearbeitens des Substrats abhaengig von dem Transmissionswert.

 

EP 2009426 A2 UPAB: 20090130 NOVELTY - The method (700) involves treating defects in the substrate material. A transmission measurement of the substrate is carried out to obtain a transmission value, which is a measurement for the defects in the substrate material (710). The processing of the substrate is actuated depending on the transmission value (720). The measurement for the defects is a measurement for a number and depth of the defects. The substrate materials are gallium nitride, aluminum nitride, alumina, or other transparent semiconductor materials. USE - Method for processing a substrate from a substrate material. ADVANTAGE - The transmission measurement of the substrate is carried out to obtain a transmission value, which is a measurement for the defects in the substrate material and the processing of the substrate is actuated depending on the transmission value, and hence ensures direct control or regulation of the treatment processes or material synthesis processes and a cost effective manufacturing and process development in the field of research and development.

: http://publica.fraunhofer.de/dokumente/N-91381.html