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Optical, electrical and structural properties of spin-on MSQ low-k dielectrics over a wide temperature range

 
: Ahner, N.; Schulz, S.E.; Blaschta, F.; Rennau, M.

:

Schulz, S.E.:
MAM2008, Proceedings of the Twelth European Workshop on Materials for Advanced Metallization 2008 : A single-session workshop devoted to materials research, materials properties and interactions. March 2 - 5, 2008, Dresden, Germany
Amsterdam: Elsevier, 2008 (Microelectronic engineering 85.2008, Nr.10)
ISSN: 0167-9317
S.2111-2113
European Workshop on Materials for Advanced Metallization (MAM) <12, 2008, Dresden>
Englisch
Konferenzbeitrag, Zeitschriftenaufsatz
Fraunhofer IZM ()
Fraunhofer ENAS ()

Abstract
Looking onto application of low-k and ultra low-k materials within FEOL, high temperature load is one of the major challenges. But also temperature ranges below standard curing conditions are of special interest, e.g. for integration of transparent low-k materials into optical devices due to their small refractive index. In this work the development of the optical, electrical and structural properties of two spin-on MSQ low-k dielectrics over a low-temperature range has been investigated. Incorporation of porosity due to porogen removal for LK2000 causes a different behaviour of the electrical and optical parameters compared to ACCUGLASS (TM) within the low-temperature range. Both materials show unstable properties which normalize by getting closer to the standard curing conditions. Hydrophobizity of the surfaces is developing at curing temperatures of 400 degrees C and higher, what agrees to the lowering of the leakage current density. Optical, electrical and structural parameters fluctuate very sensitive on changing the curing temperature, so usage of those materials within a low-temperature range requires a very stable curing process to achieve reproducible material properties.

: http://publica.fraunhofer.de/dokumente/N-85480.html