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Efficient planar-integrated free-space optical interconnects fabricated by a combination of binary and analog lithography

: Heming, R.; Wittig, L.-C.; Dannberg, P.; Jahns, J.; Kley, E.B.; Gruber, M.


Journal of Lightwave Technology 26 (2008), Nr.14, S.2136-2141
ISSN: 0733-8724
Fraunhofer IOF ()
analog lithography; microoptic; optical interconnect; planar integration; replication

Design, fabrication, and experimental testing of an integrated microoptical module for interconnection are reported. The systems integration is based on the concept of planar-integrated free-space optics. The module combines diffractive-reflective and refractive microoptics. The diffractive elements were fabricated by binary lithography and reactive ion etching. The refractive elements were made by analog lithography using a high-energy beam sensitive mask and replication in Ormocer. The fabricated module implemented a simple one-dimensional optical interconnect. Two versions were implemented for which insertion losses of approximately 8 and 4.5 dB were measured, respectively.