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Spectroscopic ellipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films

 
: Marsik, P.; Verdonck, P.; Schneider, D.; Roest, D. de; Kaneko, S.; Baklanov, M.R.

:

Arwin, H.:
Papers presented at the 4th International Conference on Spectroscopic Ellipsometry, ICSE4 : Stockholm, Sweden, 11 - 15 June 2007
Weinheim: Wiley-VCH, 2008 (Physica status solidi. C, Current topics in solid state physics 5.2008, Nr.5)
S.1253-1256
International Conference on Spectroscopic Ellipsometry (ICSE) <4, 2007, Stockholm>
Englisch
Konferenzbeitrag, Zeitschriftenaufsatz
Fraunhofer IWS ()
CVD-Beschichtung; dielektrische Funktion; dielektrische Schicht; Dielektrizitätskonstante; Ellipsometrie; Härten; Materialeigenschaft; Mikroelektronik; poröser Werkstoff; Porosimeter; Porosität; Porositätsmessung; Spektrometrie; Verdichtung

Abstract
Aurora ELK, a porous low-k SiCOH film deposited by CVD, was used to study the effect of UV curing. Samples were cured for various curing times and the purpose of this work is to observe the effects of UV curing on optical, mechanical and structural properties of the low-k film. We have used 1) ellipsometric porosimetry to determine the porosity and the pore-size distribution and 2) nitrogen purged UV ellipsometry in a range from 2 to 9 eV to observe the changes of the dielectric function of the cured material. Additional, FTIR and laser-induced surface acoustic wave measurements were performed. The effect of UV cure is to remove the porogen from the material and to improve the mechanical properties of the film. The skeleton reconstruction and hardening is followed by reduction of porosity and an increase of k-value. We measured ellipsometric spectra from 2 to 9 eV and observed an expected reduction of the adsorption band attributed to porogen, but also an undesired growth of an absorption band at 4.5 eV. One possible explanation is that this band is caused by hydrogen incorporation into the material. However for longer curing times, densification and reduction of the porosity occurs. The growth of the hydrogen incorporation has been observed.
Entnommen aus TEMA

: http://publica.fraunhofer.de/dokumente/N-81764.html