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A new method for high-rate deep dry etching of silicate glass with variable ETCH profile
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2007
Conference Paper
Titel
A new method for high-rate deep dry etching of silicate glass with variable ETCH profile
Author(s)
Bertz, A.
Fendler, R.
Schuberth, R.
Hentsch, W.
Gessner, T.
Hauptwerk
Transducers & Eurosensors 2007. 14th International Conference on Solid-State Sensors, Actuators and Microsystems. Vol.1
Konferenz
European Conference on Solid-State Transducers (Eurosensors) 2007
International Conference on Solid-State Sensors, Actuators and Microsystems 2007
DOI
10.1109/SENSOR.2007.4300076
Language
English
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Fraunhofer-Institut für Elektronische Nanosysteme ENAS
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM