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2007
Journal Article
Titel
Photocatalytic active titania - Deposition with atmospheric pressure plasma technology
Abstract
Atmospheric pressure plasma processing is a versatile tool for cost efficient wide area surface processing. CVD coatings in the lower nm-range, plasma induced surface modifications or plasmachemical etching can be provided with basically the same technological approach. The paper describes how this innovative atmospheric plasma technology can be applied for laying down thin photocatalytically active titania films on temperature sensitive substrates, e.g. stainless steel. The coatings provide a performance which is comparable to high temperature thermal CVD. The thin coatings exhibit a UV induced photo-mineralization of organic contaminants and super-hydrophilicity which can be used for making surfaces with self-cleaning functionality, for example.